TopWave 405

• 405 nm high-stability, single-frequency laser designed for demanding industrial and research applications.
• Up to 2 W optical power at 405 nm with the TopWave 405 XP configuration.
• >100 m coherence length, making it highly suitable for interferometric applications.
• <1 MHz linewidth for excellent spectral purity.
• TEM₀₀ beam quality with typical M² = 1.15.
• ≤0.6 mrad beam divergence for a well-collimated output beam.
• ≤5 µrad beam pointing stability.
• ≤1% output power stability over 8 hours.
• All-semiconductor architecture eliminates the need for a gas laser and water cooling.
• Designed as a modern replacement for Krypton-ion gas lasers operating around 406.7 nm and 413.1 nm.
• 24/7 industrial operation with a robust design tested for thousands of hours.
• Lower power consumption compared with conventional gas-laser solutions.
• Push-button operation for easy startup and use.
• Compact, turnkey system with minimal installation effort.
• Ethernet and USB interfaces for system communication and remote control.

The TOPTICA TopWave 405 is a high-stability, single-frequency 405 nm laser system designed for applications requiring high optical power, excellent beam quality, and very long coherence length.

The system was specifically developed as a modern semiconductor-based alternative to the bulky and power-hungry Krypton-ion gas lasers traditionally used in lithography and holography. By combining a semiconductor laser architecture with high coherence and watt-level output power, TopWave 405 provides a more compact and energy-efficient solution while maintaining the optical characteristics required for demanding applications.

The TopWave 405 provides single-frequency operation with a linewidth below 1 MHz and a coherence length greater than 100 m. These characteristics are particularly important in applications where stable interference patterns must be generated over relatively long optical paths, such as interference lithography and holography.

The laser produces a high-quality TEM₀₀ beam with a typical M² of 1.15, low divergence, and excellent beam-pointing stability. This combination allows the beam to be efficiently focused and used for precision pattern generation and optical processing.

One of the key advantages of TopWave 405 is its all-semiconductor architecture. Unlike Krypton-ion gas lasers, it does not require water cooling and consumes significantly less electrical power. TOPTICA specifies typical power consumption of approximately 75 W for the standard 1 W version, while the XP version provides up to 2 W with power consumption below 200 W.

The system is designed for industrial 24/7 operation, with a minimum specified lifetime of 5,000 hours and a typical lifetime of 10,000 hours according to the latest product information.

Product Type: High-Stability Single-Frequency Laser
Model: TopWave 405
Manufacturer: TOPTICA Photonics
Wavelength: 405 ± 0.5 nm
Operation: CW, Single Frequency
Linewidth: <1 MHz
Coherence Length: >100 m
Output Power: 1 W standard / up to 2 W XP
Transverse Mode: TEM₀₀
Beam Waist Diameter: 1.5 ± 0.2 mm
M²: 1.15 typ. / ≤1.3 max.
Beam Divergence: ≤0.6 mrad, full angle
Beam Ellipticity: 0.9–1.1
Beam Pointing Stability: ≤5 µrad
Polarization: Linear, Vertical
Polarization Ratio: >100:1
Power Stability: ≤1% over 8 h
RMS Noise: ≤0.6%, 10 Hz–10 MHz
Warm-Up Time: <2 h from cold start / <15 min from standby
Lifetime: 5,000 h min. / 10,000 h typ.
Cooling: Conduction Cooling
Operating Temperature: 20–30°C
Power Supply: 100–240 VAC, 50/60 Hz
Power Consumption: <100 W standard / <200 W XP
Communication: Ethernet, USB
Laser Classification: Class 4

The TopWave 405 is especially suitable for applications requiring high optical power, long coherence length, and excellent beam quality.

1. Interference Lithography

• Interference Lithography
• Microstructure Fabrication
• Nanostructure Fabrication
• Large-Area Patterning
• Photonic Structures
• Optical Gratings

The high coherence and watt-level optical power enable large-area interference patterns to be generated efficiently while reducing exposure time.

2. Holography & Augmented Reality

• Digital Holography
• Holographic Optical Elements
• Holographic Displays
• Augmented Reality (AR)
• Optical Security
• Holographic Data Storage

The >100 m coherence length is particularly valuable for holographic systems requiring stable interference over long optical paths.

3. Laser-Based Mask Writing

• Semiconductor Mask Writing
• Direct Laser Patterning
• Photomask Fabrication
• Wafer Processing
• Microfabrication

TOPTICA highlights 405 nm as an important wavelength for mask-writing applications because it is compatible with established i-line photoresist technologies.

4. Direct-Writing Lithography

• Direct-Writing Lithography
• Microfabrication
• Micro- and Nanopatterning
• Rapid Prototyping
• Custom Pattern Generation

The high optical power allows the laser to efficiently write patterns directly onto substrates without requiring a physical reticle.

5. Lithography & Microfabrication

• Semiconductor Patterning
• 3D Microprinting
• Holographic Optics
• Transparent Displays
• Photonic Devices
• Microstructured Surfaces

TOPTICA specifically identifies lithography and microfabrication as key application areas for the TopWave 405.